Reference number
ISO 16531:2013
© ISO 2024
ISO 16531:2013
Surface chemical analysis — Depth profiling — Methods for ion beam alignment and the associated measurement of current or current density for depth profiling in AES and XPS
Edition 1
2013-06
Retirada
Retirada (Edición 1, 2013)

Resumen

ISO 16531:2013 specifies methods for the alignment of the ion beam to ensure good depth resolution in sputter depth profiling and optimal cleaning of surfaces when using inert gas ions in Auger electron spectroscopy and X-ray photoelectron spectroscopy. These methods are of two types: one involves a Faraday cup to measure the ion current; the other involves imaging methods. The Faraday cup method also specifies the measurements of current density and current distributions in ion beams. The methods are applicable for ion guns with beams with a spot size below ~1 mm in diameter. The methods do not include depth resolution optimization.

Informaciones generales

  • Estado
     : Retirada
    Fecha de publicación
     : 2013-06
    Etapa
    : Retirada de la Norma Internacional [95.99]
  • Edición
     : 1
    Número de páginas
     : 18
  • Comité Técnico :
    ISO/TC 201/SC 4
    ICS :
    71.040.40 
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