ISO 5618-2:2024

Published (Edition 1, 2024)

ISO 5618-2:2024

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Abstract

This document describes a method for determining the etch pit density, which is used to detect dislocations and processing-introduced defects that occur on single-crystal GaN substrates or single-crystal GaN films.

It is applicable to the defects specified in ISO 5618-1 from among the defects exposed on the surface of the following types of GaN substrates or films: single-crystal GaN substrate; single-crystal GaN film formed by homoepitaxial growth on a single-crystal GaN substrate; or single-crystal GaN film formed by heteroepitaxial growth on a single-crystal Al₂O₃, SiC, or Si substrate.

It is applicable to defects with an etch pit density of ≤ 7 × 10⁷ cm^-2.

General information

Status
: Published

Publication date
: 2024-04

Stage
: International Standard published [60.60]
Edition
: 1

Number of pages
: 25
Technical Committee :
ISO/TC 206

ICS :
81.060.30
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