Reference number
ISO 16531:2020
International Standard
ISO 16531:2020
Surface chemical analysis — Depth profiling — Methods for ion beam alignment and the associated measurement of current or current density for depth profiling in AES and XPS
Edition 2
2020-10
Preview
ISO 16531:2020
77949
Indisponible en français
Publiée (Edition 2, 2020)

ISO 16531:2020

ISO 16531:2020
77949
Langue
Format
CHF 129
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Résumé

This document specifies methods for the alignment of the ion beam to ensure good depth resolution in sputter depth profiling and optimal cleaning of surfaces when using inert gas ions in Auger electron spectroscopy (AES) and X-ray photoelectron spectroscopy (XPS). These methods are of two types: one involves a Faraday cup to measure the ion current; the other involves imaging methods. The Faraday cup method also specifies the measurements of current density and current distributions in ion beams. The methods are applicable for ion guns with beams with a spot size less than or equal to 1 mm in diameter. The methods do not include depth resolution optimization.

Informations générales

  •  : Publiée
     : 2020-10
    : Norme internationale publiée [60.60]
  •  : 2
  • ISO/TC 201/SC 4
    71.040.40 
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