Résumé
This document specifies the test method for measuring the crystalline quality of single-crystal thin film (wafer) using the XRD method with parallel X-ray beam. This document is applicable to all of the single-crystal thin film (wafer) as bulk or epitaxial layer structure.
Informations générales
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État actuel: PubliéeDate de publication: 2020-08Stade: Norme internationale publiée [60.60]
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Edition: 1
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Comité technique :ISO/TC 206ICS :81.060.30
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